NITTA DuPont Incorporated provides a system that allows the highest-quality in CMP for the new generation. We handle many types of consumables for CMP such as not only high quality polishing pads and slurries, but also fixturing and conditioners.

In particular, our polishing pads show excellent polishing capacity through the fusion of technologies developed for silicon wafers and our unique foaming technologies. They succeed in producing excellent planarity, consistency and scratch-free.

We provide the best performance to meet customer needs.