As a leading manufacturer of polishing pads, we have been contributing to the development of state-of-the-art technologies for chemical mechanical polishing (CMP) processing since it was first introduced in semiconductor device manufacturing in 1980.
We offer not only ultra-precision surface polishing pads, for which we have the top global market share, but also polishing slurries, fixturing products, and conditioners. We provide comprehensive solutions for polishing consumables, while at the same time evolving with the times to continue contributing to society.
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(01)State of the art technologies with the top global market shareWe are the world’s top mass-producer of polishing pads for CMP. Leveraging the knowledge and know-how we’ve developed over the course of more than 40 years, we’ve elevated our technologies to even higher quality, cutting edge technologies. Furthermore, we stay a step ahead of modern needs in our research and development. Through this, we’ve established our position as a leader with advanced production technology capabilities.
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(02)Customer-first proposal and response capabilitiesOur teams of experts have a deep understanding of polishing processes and polishing mechanisms. They can meet all of our customers’ polishing needs and provide world-class technical support. We develop and propose forward-looking, comprehensive polishing solutions that match our customers’ product road maps and performance demands.
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(03)High quality products, services, and staffNot only do we supply comprehensive polishing solution products and technologies, but we pursue the ultimate in quality through the red-carpet support we provide our customers, our comprehensive services, and the diligence and care paid by each and every one of our staff in our product manufacturing, sales, and proposal activities. Our high quality extends to the finest details and contributes to the future development of society.