| 1969 | Rodel Inc. was founded in Newark, Delaware, USA. |
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| 1983 | Rodel Nitta was founded by the investment between Nitta Corporation and Rodel Inc. |
| 1984 | Started distribution of Nalco slurry(via Rodel Inc.) and Rodel Suba™ series pad. Started TA production |
| 1988 | By the technology introduction, production of polishing pad, Suba™ Pad started |
| 1989 | Production of MH™ series pad started using our proprietary technology Rodel Inc. started to supply polishing system to CMP field |
| 1992 | Production of backing material R300 series started with our proprietary technology. |
| 1993 | Started to supply polishing system to the device maker in Japan |
| 1995 | Rodel Inc. was registered for ISO 9001 By the technology introduction, constructed the slurry production plant(mainly CMP slurries) in Mie |
| 1996 | Mie plant completed |
| 1997 | Started the production of slurries for CMP field Rodel Nitta was registered for ISO 9001 |
| 1998 | Started the production of pads(IC1000™) for CMP field |
| 2000 | Rodel Particles, Inc. was founded |
| 2001 | Rodel Nitta was registered for ISO 14001 Started the production of Nanopure™ series polishing slurries |
| 2004 | The company name has been changed to Nitta Haas Incorporated Started to supply VisionPad™ series polishing pads which are DuPont’s product |
| 2005 | Kyoto plant completed |
| 2006 | Moved from Nara plant to Kyoto plant |
| 2007 | Tokyo branch (Nitta Building) remodeled |
| 2013 | Started to supply Ikonic™ series polishing pads which are DuPont’s product |
| 2016 | Yuzaki plant transferred to Kyoto plant |
| 2019 | Started to supply Novaplane™ series polishing slurries which are DuPont’s product |
| 2020 | The company name has been changed to NITTA DuPont Incorporated |
| 2021 | Merged Rodel Particles, Inc. |
